Patterning microfluidic device wettability using flow confinement
Adam R. Abate, Julian Thiele, Marie Weinhart, David A. Weitz – 2010
We present a simple method to spatially pattern the surface properties of microfluidic devices using flow confinement. Our technique allows surface patterning with micron-scale resolution. To demonstrate its effectiveness, we use it to pattern wettability to form W/O/W and O/W/O double emulsions.
Title
Patterning microfluidic device wettability using flow confinement
Author
Adam R. Abate, Julian Thiele, Marie Weinhart, David A. Weitz
Publisher
RSC
Date
2010-05-05
Identifier
DOI: 10.1039/C004124F
Source(s)
Citation
Lab Chip, 2010,10, 1774-1776.
Language
eng
Type
Text