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Production of Microfluidic Devices

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Belichtungssystem für Masken UV-KUB 2
Belichtungssystem UV-KUB 2

The UV-KUB 2 is a compact exposure‑masking system especially well-suited for the creation of microfluidic systems, integrated optical circuits and surface micro structuration by photolithography. It is equipped with an LED based optical head, collimated and homogeneous.

  • Resolution: 2 μm
  • Wave length: 365 nm oder 405 nm
  • Power density: 40 mW/cm²
  • Substrate warm-up during exposure: < 1 °C:
  • Exposure cycle: between 1 s and 18 h
  • Number of programmable cycles: 10
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Niederdruck-Plasma-System Pico diener electronic
Niederdruck-Plasma-System Pico diener electronic

The low-pressure plasma systemcan be used for cleaning of surfaces (e.g. before bonding, soldering or gluing). activation of surfaces (e.g. before printing, varnishing or gluing), etching of surfaces (e.g. microstructuring of silicon or etching of PTFE) and coating of surfaces - plasmapolymerization (e.g. deposition of hydrophobic / hydrophilic layers).

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PDMS Mixer The THINKY ARE-250
PDMS Mixer The THINKY ARE-250

The THINKY ARE-250 mixing and degassing machine is an industrial non-contact “planetary” mixer for all engineering compounds. It mixes, disperses and degasses your materials in seconds to minutes, in a sealed or lid-less container such as a jar, beaker, syringe tube or cartridge. It can be used for the mixing and/or bubble removal of not only epoxide resins but also silicones, conductive pastes, medicines, chemical materials, etc.

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Spin coater Laurell Technologies WS-650Mz-23NPPB
Spin coater Laurell Technologies WS-650Mz-23NPPB

The Spin coater is used for spin coating resist and other materials on substrates. It adapts to the surface coating for semiconductors, chemical materials, silicon, chips, substrates, and conductive glass..

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