; Patterning microfluidic device wettability using flow confinement

Adam R. Abate, Julian Thiele, Marie Weinhart, David A. Weitz— 2010

We present a simple method to spatially pattern the surface properties of microfluidic devices using flow confinement. Our technique allows surface patterning with micron-scale resolution. To demonstrate its effectiveness, we use it to pattern wettability to form W/O/W and O/W/O double emulsions.

TitlePatterning microfluidic device wettability using flow confinement
AuthorAdam R. Abate, Julian Thiele, Marie Weinhart, David A. Weitz
PublisherRSC
Date20100505
IdentifierDOI: 10.1039/C004124F
Source(s)
CitationLab Chip, 2010,10, 1774-1776.
Languageeng
TypeText